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High Frequency Dielectric Mapping Using Un-Contact Probe for Dielectric Materials

Journal Key Engineering Materials (Volume 320)
Volume Electroceramics in Japan IX
Edited by Keiichi Katayama, Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages 189-192
DOI 10.4028/www.scientific.net/KEM.320.189
Citation Hirofumi Kakemoto et al., 2006, Key Engineering Materials, 320, 189
Online since September, 2006
Authors Hirofumi Kakemoto, Song Min Nam, Satoshi Wada, Takaaki Tsurumi
Keywords Dielectric Materials, Dielectric Permittivity Mapping, High Frequency, Un-Contact Probe
Abstract

The microwave reflection intensity was measured at room temperature for Cu-plate, Al2O3 and SrTiO3 single crystals using a un-contact probe as a function of distance between sample and probe. The difference of reflection intensity for Cu-plate, Al2O3 and SrTiO3 single crystals was observed in the region where the distance of 0.2mm between sample and probe, and it was caused from dielectric permittivities of samples. The reflection coefficient of sample was estimated in comparison with results of electromagnetic simulation using finite differential time domain method. The reflection intensity for Cu-plate, Al2O3 and SrTiO3 single crystals was transformed to dielectric permittivity at reflection intensity minimum point. The dielectric permittivity mapping was also examined at reflection intensity minimum point.

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