Paper Title:
Preparation of Epitaxial LiTaO3 Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties
  Abstract

Epitaxial LiTaO3 thin films were deposited on epitaxial Pt(111)/Al2O3(001) and Al2O3(001) substrates by metal organic chemical vapor deposition using LiTa(OC2H5)4(OC2H4OCH3)2 and Li(DPM) precursors. The full-width at half-maximum of the rocking curve of LiTaO3 thin films were respectively 0.29° on Al2O3(001) substrates and 0.98° on epitaxial Pt(111)/Al2O3(001). Electrical measurements showed that the remanent polarization and coercive field of the films were 2Pr=76 μC/cm2 and E =130 kV/cm, respectively. The leakage current density was 10-6–10-8 A/cm2 at 120 kV/cm. Refractive indices n measured at 632.8 nm were measured respectively as 2.15 on Al2O3(001) and 2.14 on Pt(111)/Al2O3(001).

  Info
Periodical
Edited by
Keiichi Katayama, Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages
57-60
DOI
10.4028/www.scientific.net/KEM.320.57
Citation
T. Yamamoto, N. Wakiya, N. Mizutani, K. Shinozaki, "Preparation of Epitaxial LiTaO3 Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties", Key Engineering Materials, Vol. 320, pp. 57-60, 2006
Online since
September 2006
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$32.00
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