Preparation of Epitaxial LiTaO3 Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties |
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| Journal | Key Engineering Materials (Volume 320) |
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| Volume | Electroceramics in Japan IX |
| Edited by | Keiichi Katayama, Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki |
| Pages | 57-60 |
| DOI | 10.4028/www.scientific.net/KEM.320.57 |
| Citation | Takeki Yamamoto et al., 2006, Key Engineering Materials, 320, 57 |
| Online since | September, 2006 |
| Authors | Takeki Yamamoto, Naoki Wakiya, Nobuyasu Mizutani, Kazuo Shinozaki |
| Keywords | Electrical Property, Epitaxial, LiTaO3, MOCVD, Optical Property, Thin Film |
| Abstract | Epitaxial LiTaO3 thin films were deposited on epitaxial Pt(111)/Al2O3(001) and Al2O3(001) substrates by metal organic chemical vapor deposition using LiTa(OC2H5)4(OC2H4OCH3)2 and Li(DPM) precursors. The full-width at half-maximum of the rocking curve of LiTaO3 thin films were respectively 0.29° on Al2O3(001) substrates and 0.98° on epitaxial Pt(111)/Al2O3(001). Electrical measurements showed that the remanent polarization and coercive field of the films were 2Pr=76 μC/cm2 and E =130 kV/cm, respectively. The leakage current density was 10-6–10-8 A/cm2 at 120 kV/cm. Refractive indices n measured at 632.8 nm were measured respectively as 2.15 on Al2O3(001) and 2.14 on Pt(111)/Al2O3(001). |
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