Paper Title:
Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide
  Abstract

We investigated the effect of SiOcap layer on the thermal stability of nickel and nickel-cobalt silicide by measuring its sheet resistance. The stability of nickel silicide was deteriorated as a function of annealing temperature, while that of nickel-cobalt silicide was not. In case of both silicides, the SiOcap layer improved the stability. Tensile stress from the difference of thermal expansion coefficients between SiO2 and nickel silicide may suppress the agglomeration of nickel silicide.

  Info
Periodical
Key Engineering Materials (Volumes 321-323)
Edited by
Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi
Pages
1322-1325
DOI
10.4028/www.scientific.net/KEM.321-323.1322
Citation
K. J. Han, Y. J. Cho, S. Y. Oh, Y. J. Kim, W. J. Lee, H. D. Lee, Y. C. Kim, "Effect of SiO2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide", Key Engineering Materials, Vols. 321-323, pp. 1322-1325, 2006
Online since
October 2006
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Price
$32.00
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