Paper Title:
Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe
  Abstract

We observed the surface resistance of metal thin films by a nondestructive characterization method using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system. To demonstrate the ability of local microwave characterization, the surface resistance dependence of the metallic thin films has been mapped nondestructively.

  Info
Periodical
Key Engineering Materials (Volumes 321-323)
Edited by
Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi
Pages
1457-1460
DOI
10.4028/www.scientific.net/KEM.321-323.1457
Citation
H. J. Yoo, J. C. Kim, A. Babajayan, S. H. Kim, K. J. Lee, "Nondestructive and Non-Contact Characterization Technique for Metal Thin Films Using a Near-Field Microwave Microprobe", Key Engineering Materials, Vols. 321-323, pp. 1457-1460, 2006
Online since
October 2006
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Price
$32.00
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