Paper Title:
Yield Property Characterization for Au and TiN Thin Films by Applying Nanoindentation Technique
  Abstract

We tried to apply the nanoindentation technique to yield strength characterization by modifying a previous research. Although the yield strength determining technique developed by Kramer et al. has been successfully demonstrated for large scale indentations on bulky metals, its applicability is still doubtful to nanoscale indentations on thin films with severe roughness, anisotropy, and interfacial constraint. In order to overcome these problems, we combined the nanoindentation technique with a three-dimensional indent visualization technique in this study. Nanoindentation tests were performed for Au and TiN thin films and their corresponding indents were scanned by using an atomic force microscope. From the three-dimensional pile-up morphology, a circular pile-up boundary was measured and input into the yield strength formulation as an effective yielded zone radius. The yield strengths calculated were directly compared with those from the microtensile test.

  Info
Periodical
Key Engineering Materials (Volumes 326-328)
Edited by
Soon-Bok Lee and Yun-Jae Kim
Pages
215-218
DOI
10.4028/www.scientific.net/KEM.326-328.215
Citation
Y. H. Lee, Y. H. Huh, J. Y. Kim, S. H. Nahm, J. I. Jang, D. I. Kwon, "Yield Property Characterization for Au and TiN Thin Films by Applying Nanoindentation Technique", Key Engineering Materials, Vols. 326-328, pp. 215-218, 2006
Online since
December 2006
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$32.00
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