Paper Title:
Design of a Rubber Membrane under Substrate for Nanoimprint Lithography Process
  Abstract

Nanoimprint lithography is a promising technology to produce sub-100 nm scale features on silicon chips. One of key issues in the nanoimprint lithography is how to make uniform contact between the stamp and the substrate on a large area. In this study a rubber membrane unit under substrate is introduced to resolve this problem. Two layers of membrane were designed to consider air flow in the middle of resist on a silicon wafer. The geometry design for accomplishing uniform contact was carried out using finite element analysis. The material modeling of hyperelastic properties of rubber is characterized by the Mooney-Rivlin strain energy functions. Material constants in the strain energy functions are able to be determined via the curve fitting of experimental stress-strain data. Simple tension and equi-biaxial tests were performed to determine the material constants. To evaluate the effects of a rubber membrane unit, nanoimprint lithography process with it was executed. We could confirm that a distinct improvement of uniform contact was shown and air flow problem was solved during the process.

  Info
Periodical
Key Engineering Materials (Volumes 326-328)
Edited by
Soon-Bok Lee and Yun-Jae Kim
Pages
345-348
DOI
10.4028/www.scientific.net/KEM.326-328.345
Citation
S. W. Han, K. J. Seo, J. J. Lee, S. W. Lee, H. J. Lee, J. Y. Kim, "Design of a Rubber Membrane under Substrate for Nanoimprint Lithography Process", Key Engineering Materials, Vols. 326-328, pp. 345-348, 2006
Online since
December 2006
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Kwang Hwa Chung, J.S. Kim, J.S. Kim, Young Jin Kim
Abstract:Based on detailed two-dimensional (2-D) and three-dimensional (3-D) finite element (FE)analyses, this paper attempts to quantify in-plane and...
699
Authors: N. Matsumoto, S. Ohtaki, M. Ohira, H. Kasayama
Abstract:An application of the elastic-plastic problem by the photoelastic coating method is presented in this paper. A general procedure of this...
27
Authors: Chang Su Woo, Hyun Sung Park, Wae Gi Shin
Abstract:The material modeling of hyper-elastic properties in rubber is generally characterized by the strain energy function. The strain energy...
190
Authors: Jian Wen Chen, Hong Qing Hou, Wu Jun Chen
Chapter 1: Materials Design
Abstract:This article presents the mechanical properties of PVC coated fabrics under biaxial cyclic tensile loads. Tests of PVC at five load ratios in...
36
Authors: Huai Liang Zhu, Li Feng Yu, Jing Ni, Xue Wang, Ren An Luo
Chapter 4: Testing Technique and Devices
Abstract:This paper is aimed at investigating the influence of load-bearing style on the mechanical behavior of anisotropic engineering materials. The...
471