Paper Title:
Preparation of Titania Films on Implant Titanium by Electron Cyclotron Resonance Plasma Oxidation
  Abstract

Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

  Info
Periodical
Key Engineering Materials (Volumes 330-332)
Main Theme
Edited by
Xingdong Zhang, Xudong Li, Hongsong Fan, Xuanyong Liu
Pages
565-568
DOI
10.4028/www.scientific.net/KEM.330-332.565
Citation
H. Masumoto, T. Goto, Y. Honda, O. Suzuki , K. Sasaki, "Preparation of Titania Films on Implant Titanium by Electron Cyclotron Resonance Plasma Oxidation", Key Engineering Materials, Vols. 330-332, pp. 565-568, 2007
Online since
February 2007
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$32.00
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