Nano-Structured CrN/CNx Multilayer Films |
| Journal |
Key Engineering Materials (Volumes 334 - 335) |
| Volume |
Advances in Composite Materials and Structures |
| Edited by |
J.K. Kim, D.Z. Wo, L.M. Zhou, H.T. Huang, K.T. Lau and M. Wang |
| Pages |
893-896 |
| DOI |
10.4028/www.scientific.net/KEM.334-335.893 |
| Online since |
March, 2007 |
| Authors |
A. Vyas,
Yao Gen Shen,
Z.F. Zhou,
K.Y. Li
|
| Keywords |
CrN/CNx Multilayers, Microstructure, Reactive Closed-Field Unbalanced Magnetron Sputtering, Stress, Surface Roughness, X-Ray Photoelectron Spectroscopy (XPS) |
| Abstract |
CrN/CNx nano-scale multilayered films were deposited on Si (100) substrate by closed-field
unbalanced magnetron sputtering. Designed experimental parameters enabled an evaluation of the
effects of negative substrate bias voltage (Vb), and bi-layer thickness λ (by changing substrate
rotation rate) during deposition on the structural and mechanical properties of multilayer films.
These multilayers were characterized and analyzed by transmission electron microscope (TEM),
X-ray diffraction (XRD), atomic force microscopy (AFM), and nanoindentation measurements. In
all cases, the CNx layers were amorphous and independent of Vb, while the microstructures of the
CrN layers were dependent primarily on Vb. The CrN layers showed a mixed structure phase
consisting of CrN, Cr2N, and Cr at Vb = -(40-120) V. At higher Vb values (-140 V or above), the
Cr2N phase was dominant along with low CrN phase content. AFM measurements revealed that the
root-mean-square (rms) surface roughness of the CrN/CNx film was 2 nm at Vb= -200 V whereas
the rms values were about 9.5-3.3 nm for lower Vb values of -(40-180 V). By nanoindentation
measurements, a maximum hardness of about 36 GPa was observed at Vb= -140 V. The improved
mechanical properties of the films are correlated to the phase formation during deposition. |
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