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Morphology Control of Zirconia Thin Films Prepared Using Photochromic Precursors

Journal Key Engineering Materials (Volume 350)
Volume Electroceramics in Japan X
Edited by K. Katayama, K. Kato, T. Takenaka, M. Takata and K. Shinozaki
Pages 133-136
DOI 10.4028/www.scientific.net/KEM.350.133
Citation Kaori Nishizawa et al., 2007, Key Engineering Materials, 350, 133
Online since October, 2007
Authors Kaori Nishizawa, Haruhiko Fukaya, Takeshi Miki, Kazuyuki Suzuki, Kazumi Kato
Keywords Azobenzene Derivatives, Photochromism, Precursor, Surface Morphology, Thin Film, ZrO2 Thin films
Abstract

A new photochromic ZrO2 precursor solution was prepared using zirconium tetra-n-butoxide, 4-(phenylazo)benzoic acid and ethyleneglycol monomethylether. The density functional theory (DFT) calculation has identified that the structure of the synthesized precursor molecule changed by UV irradiation. The two kinds of thin films were prepared using the photosensitive ZrO2 precursor solution without and with UV irradiation. The surface morphology of thin films changed by UV irradiation. It was found that the surface morphology of thin films is controlled by the difference of precursor structure introduced by UV irradiation.

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