Paper Title:
Growth and Properties of Pulsed Laser Deposited K3Li2Nb5O15 Thin Films
| Periodical | Key Engineering Materials (Volume 351) |
|---|---|
| Main Theme | Composite Materials V |
| Edited by | Di Zhang, Jingkun Guo and Chi Y. A. Tsao |
| Pages | 184-188 |
| DOI | 10.4028/www.scientific.net/KEM.351.184 |
| Citation | Zu Sheng Zhan et al., 2007, Key Engineering Materials, 351, 184 |
| Online since | October, 2007 |
| Authors | Zu Sheng Zhan, Yan Sheng Gong, Qiang Shen, Lian Meng Zhang |
| Keywords | Potassium Lithium Niobate Films, Pulsed Laser Deposition (PLD), Raman Scattering, Transmittance, X-Ray Diffraction (XRD) |
| Price | US$ 28,- |
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Abstract
Potassium lithium niobate (KLN: K3Li2Nb5O15) films have been deposited on quartz glass by Pulsed laser deposition (PLD) technique using a stoichiometric KLN target as starting materials. By investigating the effects of both the oxygen pressure and the substrate temperature on the structure of KLN films, optimum parameters have been identified for the growth of high-quality KLN films. At 10Pa oxygen ambient pressure, tetragonal tungsten-bronze-type structure of KLN films with (310) preferred orientation can be achieved at substrate temperatures in the range of 700-800°C. Optical studies indicate that the films are highly transparent in the visible-near-infrared wavelength range.
