Fatigue Properties of Nanometer-Scale Copper Films |
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| Journal | Key Engineering Materials (Volumes 353 - 358) |
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| Volume | Progresses in Fracture and Strength of Materials and Structures |
| Edited by | Yu Zhou, Shan-Tung Tu and Xishan Xie |
| Pages | 116-119 |
| DOI | 10.4028/www.scientific.net/KEM.353-358.116 |
| Citation | Bin Zhang et al., 2007, Key Engineering Materials, 353-358, 116 |
| Online since | September, 2007 |
| Authors | Bin Zhang, K.H. Sun, Jun Gong, Chao Sun, Zhong Guang Wang, G.P. Zhang |
| Keywords | Copper Films, Fatigue Property, Nanometer-Scale |
| Abstract | Fatigue tests of nanometer-thick Cu films as deposited and annealed in vacuum were conducted under constant load ranges at room temperature. Fatigue strengths of the Cu films, which is defined as the critical load range being able to cause crack initiation within 106 cycles, are determined. The experimental results show that fatigue strength increases with decreasing film thickness. Fatigue cracking behaviors were characterized by electron microscope. It is also found that fatigue cracking resistance is dependent on film thickness and increases with decreasing film thickness. Size effects on fatigue properties of the nanometer-thick Cu films are discussed. |
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