Paper Title:
Influence of Temperature on Characteristics of TiAl Plasma Surface Niobiumizing
  Abstract

In this study, plasma niobium alloying of the TiAl based alloys has been carried out at 1050, 1100 and 1150°C. The effect of the alloying temperature on the characteristic of the alloyed layer was investigated by optical microscopy, scanning electronic microscopy (SEM), glow discharge spectrum (GDS) and energy dispersive spectrum (EDS). The results show that the surface roughness, chemical composition and thickness of the alloyed layer increased with the alloying temperature which is dependent on the sheath potential. A deposition layer formed on the TiAl surface at 1150 °C was resulted from the larger sheath potential or the stronger sputtering of source electrode.

  Info
Periodical
Key Engineering Materials (Volumes 353-358)
Edited by
Yu Zhou, Shan-Tung Tu and Xishan Xie
Pages
1854-1857
DOI
10.4028/www.scientific.net/KEM.353-358.1854
Citation
X. P. Liu, W. H. Tian, C. L. Guo, D. D. Chen, Z. Y. He, Z. Xu, "Influence of Temperature on Characteristics of TiAl Plasma Surface Niobiumizing ", Key Engineering Materials, Vols. 353-358, pp. 1854-1857, 2007
Online since
September 2007
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Price
$32.00
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