Paper Title:
Hardness and Elastic Modulus of ZnO Thin Films Fabricated by PLD Method
  Abstract

ZnO is an n-type semiconductor having a hexagonal wurzite structure. ZnO exhibits good piezoelectric and optical properties, and might be a good candidate for an electroluminescence device like an UV laser diode. Then, these devices are very small, their films are very thin and they are prepared in the limited size and shape, so they are unsuitable for the extensive mechanical testing. In this present work, ZnO thin films are prepared on the glass, GaAs(100), Si(100) and Si(111) substrates at various temperatures by the pulsed laser deposition (PLD) method. ZnO thin films were evaluated by X-ray diffraction (XRD) and mechanical properties such as hardness and elastic modulus were measured through the nano-indenter.

  Info
Periodical
Key Engineering Materials (Volumes 353-358)
Edited by
Yu Zhou, Shan-Tung Tu and Xishan Xie
Pages
2966-2969
DOI
10.4028/www.scientific.net/KEM.353-358.2966
Citation
H. K. Yoon, Y. S. Yu, "Hardness and Elastic Modulus of ZnO Thin Films Fabricated by PLD Method", Key Engineering Materials, Vols. 353-358, pp. 2966-2969, 2007
Online since
September 2007
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Price
$32.00
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