Paper Title:
Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current
  Abstract

An apatite layer was successfully formed on titanium substrates by electrochemical deposition under a pulse current in a metastable calcium phosphate solution, which had 1.5 times the ion concentrations of a normal simulated body fluid, but did not contain MgCl2·6H2O, at 40 °C for 30, 60, 90 and 120 minutes at the average current density of 10 mA/cm2. The thickness of the apatite layer was increased with increasing deposition time. The pulse-current deposition produced the thicker apatite layer than the direct-current deposition, and gave some effects on the surface morphology of the apatite. The pre-treatment using acid solution gave a better adhesive between apatite and substrate. It is expected that the present electrochemical deposition under a pulse current will be useful to rapidly coat apatite on metallic materials.

  Info
Periodical
Key Engineering Materials (Volumes 361-363)
Main Theme
Edited by
Guy Daculsi and Pierre Layrolle
Pages
629-632
DOI
10.4028/www.scientific.net/KEM.361-363.629
Citation
M. Kawashita, T. Hayakawa, G. H. Takaoka, "Electrochemical Deposition of Apatite on Titanium Substrates by Using Pulse Current", Key Engineering Materials, Vols. 361-363, pp. 629-632, 2008
Online since
November 2007
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Price
$32.00
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