Surface titanium oxide (TiO2) films were fabricated on implant titanium (Ti) at low temperatures by electron-cyclotron-resonance (ECR) plasma oxidation. The relationship among the oxidization conditions, crystal structure, morphology and osteoconductive property were investigated. Although crystallized TiO2 film was not prepared by thermal oxidation at 300°C, crystallized rutile-type TiO2 film was formed by ECR plasma oxidation at 300°C. Rough morphology was observed in the substrate surface oxidized by ECR plasma. Mixtures of octacalcium phosphate (OCP) and dicalcium phosphate dihydrate (DCPD) were observed after calcification. The XRD peak intensities of the OCP and DCPD formed on the ECR plasma oxidized Ti were larger than those of calcified on the thermal oxidized Ti. ECR plasma oxidation at low temperature would induce osteoconductive calcium phosphate on implant Ti.