A Study of the Microstructure and Properties of Electroformed Ni-P Model Insert |
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| Journal | Key Engineering Materials (Volumes 364 - 366) |
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| Volume | Optics Design and Precision Manufacturing Technologies |
| Edited by | Guo Fan JIN, Wing Bun LEE, Chi Fai CHEUNG and Suet TO |
| Pages | 232-236 |
| DOI | 10.4028/www.scientific.net/KEM.364-366.232 |
| Citation | Shih Tsung Ke et al., 2007, Key Engineering Materials, 364-366, 232 |
| Online since | December, 2007 |
| Authors | Shih Tsung Ke, Jeou Long Lee, Yih Min Yeh, Shuo Jen Lee, Ming Der Ger |
| Keywords | Electroforming, Internal Stress, Ni–P Alloy, Pulse Plating |
| Abstract | In this study, a Ni-P alloy electroforming nanostructure material with low surface roughness and low internal stress was developed by using a pulse current. Square-wave cathodic current modulation was employed to electrodeposit ultrafine-grained Ni-P films from an additivefree Sulfamate nickel bath. The effect of various factors, such as peak current density, duty cycle and pulse frequency on the roughness and internal stress were investigated. Pulse current significantly influences the microstructure of Ni-P alloys. The internal stress and roughness of Ni-P alloys increased as peak current density increased, but the internal stress of Ni-P alloys decreased as duty cycle decreased. |
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