Paper Title:
Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process
  Abstract

A procedure for fabricating a periodic structure on a metal at submicron order using holographic interferometry and molding processes is described. First, holographic interference using a He-Cd (325nm) laser is used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 200nm nickel thin film is then sputtered onto the positive photoresist. Pattern is then transferred to a metal using Nickel-Cobalt electroforming. Initial results show the technique can accurately control the grating’s period and depth.

  Info
Periodical
Key Engineering Materials (Volumes 364-366)
Edited by
Guo Fan JIN, Wing Bun LEE, Chi Fai CHEUNG and Suet TO
Pages
280-283
DOI
10.4028/www.scientific.net/KEM.364-366.280
Citation
W. C. Chuang, C. K. Chao, W. C. Chang, C. T. Ho, "Fabrication of High Aspect Ratio Periodical Structure on Metal Using an Electroforming Process", Key Engineering Materials, Vols. 364-366, pp. 280-283, 2008
Online since
December 2007
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Price
$32.00
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