Paper Title:
Fabrication of Phase Mask for Optical Fiber Grating
  Abstract

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.

  Info
Periodical
Key Engineering Materials (Volumes 364-366)
Edited by
Guo Fan JIN, Wing Bun LEE, Chi Fai CHEUNG and Suet TO
Pages
719-723
DOI
10.4028/www.scientific.net/KEM.364-366.719
Citation
Q. Liu, J. H. Wu, L. L. Fang, C. M. Li, "Fabrication of Phase Mask for Optical Fiber Grating", Key Engineering Materials, Vols. 364-366, pp. 719-723, 2008
Online since
December 2007
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Price
$32.00
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