Effect of Annealing on Laser-Ablated K3Li2-xNb5+xO15+2x Thin Films

Wang, Chuan Bin; Shen, Qiang; Zhang, Lian Meng; Gong, Yan Sheng; Zhan, Zu Sheng

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Paper Title:

Effect of Annealing on Laser-Ablated K₃Li_2-xNb_5+xO_15+2x Thin Films

Periodical	Key Engineering Materials (Volumes 368 - 372)
Main Theme	High-Performance Ceramics V
Edited by	Wei Pan and Jianghong Gong
Pages	302-304
DOI	10.4028/www.scientific.net/KEM.368-372.302
Citation	Zu Sheng Zhan et al., 2008, Key Engineering Materials, 368-372, 302
Online since	February, 2008
Authors	Zu Sheng Zhan, Yan Sheng Gong, Chuan Bin Wang, Qiang Shen, Lian Meng Zhang
Keywords	In Situ Annealing, Laser Ablation, Potassium Lithium Niobate Films, Transmittance
Price	US$ 28,-

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Abstract

In this study, K3Li2-xNb5+xO15+2x (KLN) thin films were prepared by laser-ablated a sintered ceramic target. For an optimum deposition condition, in-situ post annealing method was employed on as-deposited films. XRD measurements showed that KLN films with (310) preferred orientation were obtained on fused quartz substrate. Surface morphology studies indicated that in-situ post annealing could improve the surface quality of KLN thin films. The average transmittance of as-deposited and annealed films in the visible range was nearly 80% to 90%.