Paper Title:
Effect of Annealing on Laser-Ablated K3Li2-xNb5+xO15+2x Thin Films
  Abstract

In this study, K3Li2-xNb5+xO15+2x (KLN) thin films were prepared by laser-ablated a sintered ceramic target. For an optimum deposition condition, in-situ post annealing method was employed on as-deposited films. XRD measurements showed that KLN films with (310) preferred orientation were obtained on fused quartz substrate. Surface morphology studies indicated that in-situ post annealing could improve the surface quality of KLN thin films. The average transmittance of as-deposited and annealed films in the visible range was nearly 80% to 90%.

  Info
Periodical
Key Engineering Materials (Volumes 368-372)
Edited by
Wei Pan and Jianghong Gong
Pages
302-304
DOI
10.4028/www.scientific.net/KEM.368-372.302
Citation
Z. S. Zhan, Y. S. Gong, C. B. Wang, Q. Shen, L. M. Zhang, "Effect of Annealing on Laser-Ablated K3Li2-xNb5+xO15+2x Thin Films", Key Engineering Materials, Vols. 368-372, pp. 302-304, 2008
Online since
February 2008
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$35.00
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