Paper Title:
Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC
  Abstract

SiC films were prepared by HFCVD technique on (111) Si substrate. The composition and the structure of the films were investigated using EDX, XRD and transient fluorescence. Results indicated the films deposited were nanocrystalline and the calculation of the grain size gave a further confirmation. PL measurement of the present films showed that there existed a strong ultraviolet emission at room temperature.

  Info
Periodical
Key Engineering Materials (Volumes 368-372)
Edited by
Wei Pan and Jianghong Gong
Pages
319-321
DOI
10.4028/www.scientific.net/KEM.368-372.319
Citation
H. Wang, T. W. Li, Z. X. Tang, J. H. You, X. R. Liu, Q. D. Chen, "Ultraviolet Photoluminescence on Nano-Crystalline 6H-SiC", Key Engineering Materials, Vols. 368-372, pp. 319-321, 2008
Online since
February 2008
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$32.00
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