Paper Title:
Effect of Annealing Temperature on the Microstructure of Barium Strontium Titanate Films
  Abstract

Barium strontium titanate (Ba1−xSrxTiO3, BST) films have been prepared on Pt/Ti/SiO2/Si by medium frequency (MF) magnetron sputtering, and subsequently in situ crystallized at 500-700°C. The microstructures of the MF-BST films are studied. BST films prepared by radio frequency (RF) magnetron sputtering and exhibited preferential (110) orientation, are compared. XRD shows that the MF-BST films exhibit preferential (111) orientation and better crystallization than the RF-BST films at the same annealing temperature. AFM displayed that the MF-BST films were smooth and compact. XPS analysis exhibited that the MF-BST films revealed better surface and interface structural characteristics. Their dielectric properties were also compared.

  Info
Periodical
Key Engineering Materials (Volumes 368-372)
Edited by
Wei Pan and Jianghong Gong
Pages
56-58
DOI
10.4028/www.scientific.net/KEM.368-372.56
Citation
J. X. Liao, E. Q. Li, Z. Tian, J. Xu, H. G. Yang, "Effect of Annealing Temperature on the Microstructure of Barium Strontium Titanate Films", Key Engineering Materials, Vols. 368-372, pp. 56-58, 2008
Online since
February 2008
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Price
$32.00
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