Paper Title:
Evolution of Nanoindentation Hardness of Fe/Cu Nanometer-Scale Multilayers by Magnetron Sputtering
  Abstract

Fe/Cu nanometer-scale multilayers with nominal modulation wavelengths ranging from 5 to 40 nm are deposited by direct current magnetron sputtering on Si (100) substrates. Modulation structures of the multilayers are examined by small angle / wide angle x-ray diffraction (SA/WAXRD) and cross-sectional transmission electron microscopy (XTEM). Hardness of the multilayers is measured by using nanoindentation. All the multilayers have Fe (110) and Cu (111) textures. Interface coherency is observed in the multilayers with designed modulation wavelengths of 5 and 10 nm. The hardness increases firstly and then deceases with increasing the modulation wavelength, and reaches peak value of 7.29±0.29 GPa in the multilayers with nominal modulation wavelength of 10 nm. The evolution of the hardness of the mulitlayers is explained by interface width and modulus difference between sublayers.

  Info
Periodical
Key Engineering Materials (Volumes 373-374)
Main Theme
Edited by
M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
Pages
104-107
DOI
10.4028/www.scientific.net/KEM.373-374.104
Citation
J. Gao, Z.L. Wu, Z.P. Zhang, B.S. Cao, M.K. Lei, "Evolution of Nanoindentation Hardness of Fe/Cu Nanometer-Scale Multilayers by Magnetron Sputtering", Key Engineering Materials, Vols. 373-374, pp. 104-107, 2008
Online since
March 2008
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Hun Kee Lee, Seong Hyun Ko, Hyun Chul Park
Abstract:A model describing nanoindentation as plastic deformation resulting from a strain gradient is investigated. Using a simplified axisymmetric...
911
Authors: Shu Yong Tan, Xu Hai Zhang, Xiang Jun Wu, Feng Fang
Abstract:CrNx films were synthesized under graded/constant bias by DC magnetron sputtering. In the present work, the graded bias deposited CrNx films...
1476
Authors: Kun Liang, Guan Ben Du, Omid Hosseinaei, Si Qun Wang, Hui Wang
Abstract:To find out the penetration of PF into the wood cell wall and its effects onthe mechanical properties in the cellular level, the elastic...
1746
Authors: Shinji Muraishi, Masaaki Takaya
Chapter 23: Thin Films & Interface Engineering
Abstract:The size dependent hardening in Al-4wt%Cu thin film on Si substrate has been investigated by the numerical calculation of indentation stress...
2892
Authors: C.L. Zhong, P.A. Wei, L.E. Luo
Chapter 1: Material Engineering and its Application Technology
Abstract:A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin...
93