Paper Title:
Micro-Raman Analysis on Scratch of Si Surface Modified by Ion Implantation
  Abstract

Surface modification mechanism on scratch of ion implanted p-Si (100) is investigated by scanning electric microscopy and micro-Raman spectroscopy. Raman experimental results reveal that the amorphous Si appears near the scratch during the scratching process, while the ion implantation adjusts the structural parameters of the amorphous Si and changes the residual stress state of the surface scratch from tension to compression. Moreover, Raman experimental results reveal that the laser power synchronously decreases Raman shift and full width of half maximum intensity (FWHM). The laser heating effect can be neglected because a lower laser power is selected in our measurements.

  Info
Periodical
Key Engineering Materials (Volumes 373-374)
Main Theme
Edited by
M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
Pages
497-500
DOI
10.4028/www.scientific.net/KEM.373-374.497
Citation
Z. K. Lei, X. M. Pan, G. Liu, H. Yun, Z. X. Mu, "Micro-Raman Analysis on Scratch of Si Surface Modified by Ion Implantation ", Key Engineering Materials, Vols. 373-374, pp. 497-500, 2008
Online since
March 2008
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$32.00
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