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PVD-PECVD Hybrid Processes: Synthesis of Composite Thin Films and Process Understanding

Journal Key Engineering Materials (Volumes 373 - 374)
Volume Surface Engineering
Edited by M.K. Lei, X.P. Zhu, K.W. Xu and B.S. Xu
Pages 93-99
DOI 10.4028/www.scientific.net/KEM.373-374.93
Citation Thierry Belmonte et al., 2008, Key Engineering Materials, 373-374, 93
Online since March, 2008
Authors Thierry Belmonte, A. Daniel, T. Duguet
Keywords Composite, HMDSO, Hybrid Process, SiO2, Thin Film, Titania (TiO2), Zinc Oxide ZnO
Abstract

After reviewing most of the recent developments performed on hybrid processes, basic physical phenomena of PVD-PECVD processes are detailed with the help of a model showing the different influences of main process parameters. Ti-Si-O and Zn-Si-O thin films are synthesized as possible examples of composite thin films. Limitations of the model developed are also discussed with respect to the composition and structure of deposited thin films.

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