Simulation of Light Scattering from Nanostructured Surfaces |
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| Journal | Key Engineering Materials (Volumes 381 - 382) |
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| Volume | Measurement Technology and Intelligent Instruments VIII |
| Edited by | Wei Gao, Yasuhiro Takaya, Yongsheng Gao and Michael Krystek |
| Pages | 27-30 |
| DOI | 10.4028/www.scientific.net/KEM.381-382.27 |
| Citation | Andreas Tausendfreund et al., 2008, Key Engineering Materials, 381-382, 27 |
| Online since | June, 2008 |
| Authors | Andreas Tausendfreund, S. Patzelt, S. Simon, G. Goch |
| Keywords | Far-Field Simulation, In-Process Metrology, Light Scattering, Micro Metrology, Nano Metrology, Nano Structure |
| Abstract | This paper presents an efficient computation method to evaluate scattered light intensity distributions, generated by a nanostructured surface which is illuminated with a monochromatic laser beam of several millimeters in diameter. The new simulation approach based on a modified Huygens-Fresnel approximation enables to improve measuring methods without expensive and time consuming experiments. The qualitative verification of the model results in a roughness measuring principle based on double scattering of coherent light. |
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