Paper Title:
Positional Detection in Grating Mosaic Based on Image Processing of Far-Field Diffraction Intensity Patterns in Two Wavelengths
  Abstract

As an alternative for producing the meter-size diffraction grating demanded in many technical field, grating mosaic requires positional detection with accuracy of sub-microns. In this paper, we propose a positional detection method based on image processing of three far-field diffraction intensity patterns in two wavelengths. With a set of detailed adjustment steps deduced from theoretical analysis, we successfully detected and separated the two positional errors. Moreover, with the three patterns we enlarged the target range of coarse adjustment required for further fine adjustment in longitudinal position. We achieved positional detection sensitivity of less than 14 nm, and diagnosed the alignment with the far-field pattern in a third wavelength.

  Info
Periodical
Key Engineering Materials (Volumes 381-382)
Edited by
Wei Gao, Yasuhiro Takaya, Yongsheng Gao and Michael Krystek
Pages
291-294
DOI
10.4028/www.scientific.net/KEM.381-382.291
Citation
Y. Hu, L. J. Zeng, "Positional Detection in Grating Mosaic Based on Image Processing of Far-Field Diffraction Intensity Patterns in Two Wavelengths", Key Engineering Materials, Vols. 381-382, pp. 291-294, 2008
Online since
June 2008
Export
Price
$32.00
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