Paper Title:
Epitaxial Growth of LSMO Film Prepared by Excimer Laser-Assisted Metal Organic Deposition (ELAMOD)
  Abstract

The La1-xAxMnO3 (A=Sr, Ca, Ba) film was prepared by excimaer laser-assisted metal organic deposition (ELAMOD). To understand the important controlling factor of the epitaxial growth using ELAMOD, the effects of the substrate temperature, substrate type, wavelength, and film thickness on the epitaxial growth were investigated. When the film thickness was 200nm with heating at 250°C, a polycrystalline LSMO film was formed on the LAO substrate. On the other hand, at 80nm, an epitaxial LSMO film was formed on the LAO substrate at 500°C. The epitaxial growth of the LSMO film was found to be dependent on the substrate materials and the laser wavelength. The formation of the epitaxial and polycrystalline LSMO films was discussed

  Info
Periodical
Edited by
Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages
133-136
DOI
10.4028/www.scientific.net/KEM.388.133
Citation
T. Tsuchiya, K. Daoudi, T. Nakajima, T. Kumagai, "Epitaxial Growth of LSMO Film Prepared by Excimer Laser-Assisted Metal Organic Deposition (ELAMOD)", Key Engineering Materials, Vol. 388, pp. 133-136, 2009
Online since
September 2008
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