Paper Title:
Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties
  Abstract

Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at = 632.8 nm, which is close to that of bulk crystal.

  Info
Periodical
Edited by
Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages
179-182
DOI
10.4028/www.scientific.net/KEM.388.179
Citation
R. Morohashi, N. Wakiya, T. Kiguchi, T. Yoshioka, M. Tanaka, K. Shinozaki, "Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties", Key Engineering Materials, Vol. 388, pp. 179-182, 2009
Online since
September 2008
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