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Photoluminescence from ZnO Thin Film Deposited on R-Plane Sapphire Substrate by RF Magnetron Sputtering

Journal Key Engineering Materials (Volume 388)
Volume Electroceramics in Japan XI
Edited by Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages 19-22
DOI 10.4028/www.scientific.net/KEM.388.19
Online since September, 2008
Authors Shigeru Tanaka, Yukari Ishikawa, Toshiyuki Suzuki, Noriyoshi Shibata
Keywords Epitaxial Growth, Photoluminescence, R-Plane Sapphire, Thin Film, Zinc Oxide ZnO
Abstract Photoluminescence from epitaxial ZnO thin films deposited on R-plane sapphire substrates by RF magnetron sputtering was investigated. The intensity of the near band emission (NBE) of the ZnO thin film on R-plane sapphire was stronger than that of the film formed on C-plane sapphire at a low temperature. Some experimental results suggest that NBE depends on the polarization of the excitation light, which are considered to be related to the ZnO crystal orientation on the sapphire substrate.
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