Fundamental Research on Generation of Nanostructure
by Means of Local Anodic Oxidation |
| Journal |
Key Engineering Materials (Volumes 389 - 390) |
| Volume |
Advances in Abrasive Technology XI |
| Edited by |
Tsunemoto Kuriyagawa, Libo Zhou, Jiwang Yan and Nobuhito Yoshihara |
| Pages |
424-429 |
| DOI |
10.4028/www.scientific.net/KEM.389-390.424 |
| Online since |
September, 2008 |
| Authors |
Yumetaka Suehisa, Toshiaki Aoki, Jun Shimizu, Li Bo Zhou, Hiroshi Eda |
| Keywords |
Contact Width, Distance Between Terminals, Local Anodic Oxidation, Protrusion Pattern, Scanning Probe Microscope, Si Wafer, Voltage |
| Abstract |
A method to easily and economically manufacture more precise patterns compared with
usual MEMS technique has been searched for. Under such circumstances, this research aims to clarify
the formation of nano-scale protrusion structure produced by local anodic oxidation on Si wafer
surface in expectation of the nano/micro mold production for nanoimprint lithography in future. In
this report, the influences of contact width and distance between probe tip and Si wafer surface
(distance between terminals) on the size and shape of protrusion patterns were examined in order to
clarify the fundamental phenomena in local anodic oxidation. A scanning probe microscope equipped
with a current measuring unit was utilized in local anodic oxidation experiments. As a result, it was
confirmed that the size of generated protrusion structure became larger with increasing the contact
width and became smaller with increasing the distance between probe tip and Si wafer surface. These
facts will be useful in producing 3-D nanostructures in future. |
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