Paper Title:
Surface Structuring of α/β-Sialon Ceramics by Plasma-Etching
  Abstract

Effects of plasma etching on mixed /-sialon ceramics with different /-ratiowere investigated. A mix of CF4/O2 in a ratio of 2:1 was chosen as reactive gas. Parameters such as etching time and the material composition were examined. It was shown that -grains exhibit a larger etching rate than the grain boundary glassy phase or the -grains, generating pockets in a range of few µm. The so created surfaces were characterized both by scanning electron microscopy (SEM) and by atomic force microscopy (AFM) in contact mode. These complementary techniques also enabled the determination of the bearing ratio.

  Info
Periodical
Edited by
Katsutoshi Komeya, Yi-Bing Cheng, Junichi Tatami and Mamoru Mitomo
Pages
99-102
DOI
10.4028/www.scientific.net/KEM.403.99
Citation
M. Riva, R. Oberacker, M. J. Hoffmann, C. Ziebert, "Surface Structuring of α/β-Sialon Ceramics by Plasma-Etching", Key Engineering Materials, Vol. 403, pp. 99-102, 2009
Online since
December 2008
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Price
$32.00
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