Paper Title:
Development of Novel XY Micropositioning Stage
  Abstract

Along with the rapid development of semiconductor, photonics and ultra-precision engineering, ultra-precision positioning stages are becoming more necessary than ever. In this study, one novel XY micropositioning stage is proposed, in which bi-axis circular notch flexure and cantilever hinge mechanism are optimal designed as bearing to provide smooth and guided motion. The theoretical stiffness of stage is provided and verified by FEM analysis. Finally, the micro-positioning stage is built and its resolution is experimentally validated to be less than 4nm.

  Info
Periodical
Key Engineering Materials (Volumes 407-408)
Edited by
Fan Rui, Qiao Lihong, Chen Huawei, Ochi Akio, Usuki Hiroshi and Sekiya Katsuhiko
Pages
103-106
DOI
10.4028/www.scientific.net/KEM.407-408.103
Citation
H. W. Chen, D. H. Jiang, I. Hagiwara, "Development of Novel XY Micropositioning Stage", Key Engineering Materials, Vols. 407-408, pp. 103-106, 2009
Online since
February 2009
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Price
$35.00
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