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Effects of Pretreatments on Deposition Rate of Films in Aerosol Deposition Method

Journal Key Engineering Materials (Volumes 421 - 422)
Volume Asian Ceramic Science for Electronics III and Electroceramics in Japan XII
Edited by Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki
Pages 165-168
DOI 10.4028/www.scientific.net/KEM.421-422.165
Citation Kensuke Mihara et al., 2009, Key Engineering Materials, 421-422, 165
Online since December, 2009
Authors Kensuke Mihara, Takuya Hoshina, Hirofumi Kakemoto, Hiroaki Takeda, Takaaki Tsurumi
Keywords Aerosol Deposition Method, Barium Titanate, Pre-Treatment, Thick Film
Abstract

In the aerosol deposition method (ADM), we investigated an influence of pre-treatments for barium titanate powders as raw material on the deposition rate of thick films. By sieving and drying the powder, deposition rate of the films fabricated by ADM was effectively enhanced. On the other hand, heating the powders at 400-800℃, the resulting powders caused low deposition rate of the films. When a planetary milling was performed prior to charge aerosol chamber, the deposition rate of the films was four times higher than that in deposition using the powder without milling. By changing the milling rotation rate, we control size of agglomerated particles consisting of powders, which results in the control of deposition rate of the films.

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