Paper Title:
Zinc Self-Diffusion in Isotopic Heterostructured Zinc Oxide Thin Films
  Abstract

Zinc isotopic heterostructured zinc oxide thin films of 64ZnO/68ZnO/64ZnO were synthesized using pulsed laser deposition. The pulsed laser was first irradiated onto a polycrystalline target of 64ZnO to deposit the 64ZnO layer, then onto the 68ZnO target to prepare the 68ZnO layer and finally, the 64ZnO target was used again. The 64ZnO/68ZnO/64ZnO layered thin film was thus obtained. The thin films were annealed at various diffusion annealing temperatures. Diffusion profiles of the zinc isotopes due to the annealing were evaluated using secondary ion mass spectrometry (SIMS). The diffusion coefficients were slightly higher near the interface between the thin film and the substrate (the inner region) compared to the near surface (the outer region).

  Info
Periodical
Key Engineering Materials (Volumes 421-422)
Edited by
Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki
Pages
193-196
DOI
10.4028/www.scientific.net/KEM.421-422.193
Citation
K. Matsumoto, Y. Adachi, T. Ohgaki, I. Sakaguchi, T. Nakagawa, N. Ohashi, H. Haneda, "Zinc Self-Diffusion in Isotopic Heterostructured Zinc Oxide Thin Films", Key Engineering Materials, Vols. 421-422, pp. 193-196, 2010
Online since
December 2009
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$32.00
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