Preparation of CaBi4Ti4O15 Based Thick Films on Si Substrates by Screen Printing |
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| Journal | Key Engineering Materials (Volumes 421 - 422) |
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| Volume | Asian Ceramic Science for Electronics III and Electroceramics in Japan XII |
| Edited by | Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki |
| Pages | 50-53 |
| DOI | 10.4028/www.scientific.net/KEM.421-422.50 |
| Citation | Tatsunori Kakuda et al., 2009, Key Engineering Materials, 421-422, 50 |
| Online since | December, 2009 |
| Authors | Tatsunori Kakuda, Tomoaki Futakuchi, Tsutomu Obata, Yuichi Sakai, Masatoshi Adachi |
| Keywords | CaBi4Ti4O15, Screen Printing, Thick Film |
| Abstract | CaBi4Ti4O15 based thick films were prepared by screen-printing method on Si substrates. Screen-printable pastes were prepared by kneading the CaBi4Ti4O15 powder in a three-roll mill with an organic vehicle. The remanent polarization of 6.3 C/cm2 and coercive field of 130kV/cm were obtained for the CaBi4Ti4O15 with Nb2O5 1wt% thick film fired at 1130°C. The cavity structure was prepared by etching of Si substrate. The displacement-electric field butterfly curves were obtained. |
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