Paper Title:
ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD
  Abstract

We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at ~34.46°, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).

  Info
Periodical
Key Engineering Materials (Volumes 428-429)
Edited by
Yuan Ming Huang
Pages
447-449
DOI
10.4028/www.scientific.net/KEM.428-429.447
Citation
W. Tang, X. Yang, C. Wang, C. Zhao, X. Gao, J. Yang, B. Liu, H. Liang, J. Zhao, J. Sun, G. Du, "ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD", Key Engineering Materials, Vols. 428-429, pp. 447-449, 2010
Online since
January 2010
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