Paper Title:
Growth of ZnO Films under Different Oxygen Partial Pressures by Metal Organic Chemical Vapour Deposition
  Abstract

ZnO films were grown under different oxygen partial pressures by metal organic chemical vapor deposition on the substrates of Corning glass. We investigated the quality of the films by SIEMENS D8 X-ray diffractometer. The surface morphology of the films were observed by Digital Nanoscope ІІІa AFM with normal silicon nitride tip in the contact mode. The hall effect measurements were carried out with indium ohmic contact. The transmission spectrum of the films were measured. The transmission ratio is larger than 80% in the region above the wavelength of 385nm, and sharply decreased under 10% below the wavelength of 375 nm.

  Info
Periodical
Key Engineering Materials (Volumes 428-429)
Edited by
Yuan Ming Huang
Pages
458-461
DOI
10.4028/www.scientific.net/KEM.428-429.458
Citation
C. Wang, X. Yang, B. Liu, C. Zhao, W. Tang, J. Yang, X. Gao, H. Liang, J. Zhao, J. Sun, G. Du, "Growth of ZnO Films under Different Oxygen Partial Pressures by Metal Organic Chemical Vapour Deposition", Key Engineering Materials, Vols. 428-429, pp. 458-461, 2010
Online since
January 2010
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$32.00
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