Paper Title:
Bi4Ti3O12 and Bi3.25La0.75Ti3O12 Thin Films Prepared by RF Magnetron Sputtering
  Abstract

Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) ferroelectric thin films were deposited on Pt/Si substrates by RF magnetron sputtering with Bi4Ti3O12 (BTO) and Bi3.25La0.75Ti3O12 (BLT) targets with 50-mm diameter and 5-mm thickness. The microstructure and ferroelectric properties of thin films were investigated. The grain growth behavior and ferroelectric properties such as remanent polarization were different in these two kinds of film, the effects of La doping in the BLT thin film were very obvious.

  Info
Periodical
Key Engineering Materials (Volumes 434-435)
Edited by
Wei Pan and Jianghong Gong
Pages
296-299
DOI
10.4028/www.scientific.net/KEM.434-435.296
Citation
J. P. Yang, X. A. Li, A. Y. Zuo, Z. B. Yuan, Z. L. Weng, "Bi4Ti3O12 and Bi3.25La0.75Ti3O12 Thin Films Prepared by RF Magnetron Sputtering", Key Engineering Materials, Vols. 434-435, pp. 296-299, 2010
Online since
March 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Masahiro Kurachi, Hirofumi Matsuda, Takashi Iijima, Hiroshi Uchida, Seiichiro Koda
Abstract:Nd-substituted Bi4Ti3O12 (BNT) polycrystalline thin films with preferred a-/b-axes orientations were grown on sputter-grown IrO2(101) layers...
57
Authors: Jia Xuan Liao, C.R. Yang, J.H. Zhang, H. Chen, C.L. Fu, W.J. Leng
Abstract:Ba0.6Sr0.4TiO3 (BST) thin films deposited on Pt/Ti/SiO2/Si substrates by radio frequency magnetron sputtering and crystallized by rapid...
374
Authors: Xue Hui Wang, Wu Tang, Ji Jun Yang
Chapter 6: Material Design of Computer Aided
Abstract:The porous Cu film was deposited on soft PVDF substrate by magnetron sputtering at different sputtering pressure. The microstructure and...
1451
Authors: L.L. Li, Qiu Xiang Liu, Yan Zou, Xin Gui Tang, Yan Ping Jiang
Chapter 1: Advanced Material Science and Engineering, Material Processing and Manufacturing Technology
Abstract:Bi0.9Nd0.1FeO3 (BNFO) films were deposited on Si (100) and (La,Sr)(Al,Ta)O3 (100) (LAST) substrate by radio frequency (RF) magnetron...
146