Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure |
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| Journal | Key Engineering Materials (Volume 437) |
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| Volume | Measurement Technology and Intelligent Instruments IX |
| Edited by | Yuri Chugui, Yongsheng Gao, Kuang-Chao Fan, Roald Taymanov and Ksenia Sapozhnikova |
| Pages | 45-50 |
| DOI | 10.4028/www.scientific.net/KEM.437.45 |
| Citation | Zhuang De Jiang et al., 2010, Key Engineering Materials, 437, 45 |
| Online since | May, 2010 |
| Authors | Zhuang De Jiang, Feng Xia Zhao, Wei Xuan Jing, Philip D. Prewett, Kyle Jiang |
| Keywords | Line Edge Roughness, Motif Parameter, Nano Structure, Nanoroughness |
| Abstract | Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable. |
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