Paper Title:
Fabrication of Large Grating by Monitoring the Latent Fringe Pattern
  Abstract

Contemporary chirped-pulse-amplified high-power laser systems rely on meter-sized diffraction gratings for pulse compression. Fabricating large gratings is a bottle-neck problem. We developed a multiple-holographic-exposure method to fabricate large monolithic gratings. In consecutive exposures, the attitude of the photoresist-coated substrate is monitored and adjusted by using two interferometers with a He-Ne laser, and the relative position between the substrate and the exposure interference fringes is adjusted by using the interference fringes between the diffraction orders of the latent grating with the exposure beams as the incident beams. A mosaic grating with a size of 80×50 mm2 was fabricated, and the wavefront aberration of the 1st-order diffraction wavefront in the mosaic area is better than /10 PV @633 nm.

  Info
Periodical
Edited by
Yuri Chugui, Yongsheng Gao, Kuang-Chao Fan, Roald Taymanov and Ksenia Sapozhnikova
Pages
56-60
DOI
10.4028/www.scientific.net/KEM.437.56
Citation
L. J. Zeng, L. Shi, L. F. Li, "Fabrication of Large Grating by Monitoring the Latent Fringe Pattern", Key Engineering Materials, Vol. 437, pp. 56-60, 2010
Online since
May 2010
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Price
$32.00
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