Paper Title:
Optical and Structural Analysis of GeC Thin Films Deposited by Reactive Pulsed Laser Ablation Technique
  Abstract

GeC thin films have been prepared by reactive pulsed laser ablation technique. Methane pressure (PCH4) was varied from 0 to 75 milli torrs (mT). Optical analysis of all the samples was performed by spectroscopic ellipsometry (SE). The optical constants i.e. refractive index (n), extinction coefficient (k), absorption coefficient (α) and thickness of deposited film(s) were obtained by modeling and simulations of ellipsometric data. It was found that deposition parameter (change in pressure of methane) has a profound effect on the properties of the deposited films. To support our results of optical analysis, other important diagnostic techniques like atomic force microscopy (AFM), Fourier Transform Infrared Spectroscopy (FTIR) etc. were employed.

  Info
Periodical
Edited by
Shaheed Khan, Iftikhar us Salam and Karim Ahmed
Pages
178-186
DOI
10.4028/www.scientific.net/KEM.442.178
Citation
H.Z. Shafi, A. Mahmood, Z. Ali, M. Mehmood, "Optical and Structural Analysis of GeC Thin Films Deposited by Reactive Pulsed Laser Ablation Technique", Key Engineering Materials, Vol. 442, pp. 178-186, 2010
Online since
June 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: S.S. Tzeng, Wei Min Wu, J.S. Hsu
Abstract:Diamond-like carbon (DLC) films were synthesized by RF plasma enhanced chemical vapor deposition using methane as carbon source. Effect of...
3574
Authors: F.K. Shan, G.X. Liu, Byoung Chul Shin, Won Jae Lee, W.T. Oh
Abstract:High-quality In2O3 powder and ZnO powder had been used to make the ceramic target and the atomic ratio of 1 to 1 of indium and zinc had been...
308
Authors: Gaurav Shukla, Alika K. Khare
Abstract:TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors,...
65
Authors: Masami Aono, Shunsuke Kikuchi, Nobuaki Kitazawa, Yoshihisa Watanabe
Abstract:Amorphous carbon nitride (a-CNx) thin films were deposited by rf-reactive sputtering method using a graphite target, and after deposition the...
818
Authors: Feng Gao, Qing Nan Zhao, Xiu Jian Zhao, Yu Hong Dong
Abstract:Silicon Nitride thin films were deposited on glass substrates by r.f. magnetron sputtering with a mixture gas of N2 and Ar. The properties of...
1391