Dielectric Properties of HfO2 Films Prepared on Flexible Polymer Substrates Using UV Irradiation |
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| Journal | Key Engineering Materials (Volume 445) |
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| Volume | Electroceramics in Japan XIII |
| Edited by | Shinobu Fujihara and Tadashi Takenaka |
| Pages | 164-167 |
| DOI | 10.4028/www.scientific.net/KEM.445.164 |
| Citation | Kazuyuki Suzuki et al., 2010, Key Engineering Materials, 445, 164 |
| Online since | July, 2010 |
| Authors | Kazuyuki Suzuki, Kazumi Kato |
| Keywords | HfO2, Precursor Solution, Thin Film, UV-Irradiation |
| Abstract | The HfO2 films were prepared on the ITO/polyimide substrate using alkoxy-derived precursor solutions at low temperature. The HfO2 films prepared by UV-assisted process using the precursor solution modified with diethanolamine had smooth surface and RMS roughness values of HfO2 film were 1.2nm. The electrical properties of HfO2 films were improved by optimization of preparation condition. The leakage current density at 1V was below 10-5A/cm2. The dielectric constant was about 20. The loss tangent was below 0.1. |
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