Paper Title:
Deformation Mode Construction Using Photoresist Microstructure Devices Produced with Nanoindention Technology
  Abstract

In this study, we try to produce SU-8 photoresist microstructure devices using nano-imprint technology, and try to conduct nano-indention tests on SU-8 photoresist with nano-indention detector, in order to describe the behaviors and characteristics of nano-indentions on SU-8 microstructure devices and establish the deformation mode for the indention under nano-meter level. The tests tell us that, after nano-indention tests, the result indention hardness increases with the loading rate, indention repeats, and reduction of load or depth. Similarly, the indention hardness decreases because of reduction of loading rate, extension of loading time, and increase of load, and depth. Finally, we propose a deformation mode for nano-indention. This mode can also be used to explain the deformation behavior of SU-8 under nano-indention.

  Info
Periodical
Key Engineering Materials (Volumes 447-448)
Edited by
Jianhong Zhao, Masanori Kunieda, Guilin Yang and Xue-Ming Yuan
Pages
539-543
DOI
10.4028/www.scientific.net/KEM.447-448.539
Citation
Y. J. Weng, Y. C. Weng, H. K. Liu, L. H. Chiu, "Deformation Mode Construction Using Photoresist Microstructure Devices Produced with Nanoindention Technology", Key Engineering Materials, Vols. 447-448, pp. 539-543, 2010
Online since
September 2010
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Price
$32.00
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