Paper Title:
Fabrication of Nanometer Sized Si Dot Arrays Using Ar Ion Milling with Calixarene Resist Dot Arrays
  Abstract

In this study, we investigated the possibility of forming the fine Si dot arrays by means of electron beam (EB) lithography and dry etching technique for the future’s devices with nano-scale structures. We examined the properties of Ar ion milling for the fabrication of nanometer sized Si dot arrays on a Si substrate. We have succeeded in forming 40 nm pitched Si dot arrays with a diameter of <20 nm using dot array patterns of the calixarene resist as a mask. We also obtained the Ar ion milling property that there exists the horizontal milling rate as well as the vertical milling rate. We formed Si dot arrays with a dot diameter of about 10 nm using this property. It was clarified that Ar ion milling and EB lithography with calixarene resist has the potential to form Si nano dot arrays for the nano devices.

  Info
Periodical
Edited by
Osamu Hanaizumi and Masafumi Unno
Pages
116-119
DOI
10.4028/www.scientific.net/KEM.459.116
Citation
T. Tamura, Y. Tanaka, T. Akahane, Y. Yin, S. Hosaka, "Fabrication of Nanometer Sized Si Dot Arrays Using Ar Ion Milling with Calixarene Resist Dot Arrays", Key Engineering Materials, Vol. 459, pp. 116-119, 2011
Online since
December 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Takuya Komori, Hui Zhang, Takashi Akahane, Zulfakri bin Mohamad, You Yin, Sumio Hosaka
Chapter 3: Nano-Science and Technology
Abstract:We investigated the effect of ultrahigh-resolution salty (NaCl contained) development of hydrogen silsesquioxane (HSQ) resist on forming fine...
113
Authors: Zulfakri bin Mohamad, Rosalena Irma Alip, Takuya Komori, Takashi Akahane, Hui Zhang, Miftakhul Huda, You Yin, Sumio Hosaka
Chapter 3: Nano-Science and Technology
Abstract:CoPt magnetic dot arrays with a fine pitch of 30 nm have been fabricated using electron beam (EB) lithography and ion milling. The...
118
Authors: Sumio Hosaka, Zulfakri bin Mohamad, You Yin, Hiroshi Sakurai, Yuji Kondo, Jun Ariake, Naoki Honda, Motohiro Suzuki
Chapter 3: Nano-Science and Technology
Abstract:We have studied the coercive force of fine magnetic CoPt dot enhanced by nanometer-sizing of the dot. The 39-to 106-nm-sized CoPt magnetic...
122
Authors: Hui Zhang, Miftakhul Huda, Jing Liu, Yu Long Zhang, Tao Jin, Sumio Hosaka, You Yin
I. Micro- and Nano-Science and Technologies
Abstract:We demonstrate the possibility of forming long-range-ordered self-assembled nanodot arrays with dots size of 5 nm and pitches of 10×7.5...
3