Paper Title:
Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material
  Abstract

Temperature plays a vital role in the machining industry today. A Nickel-Chrome versus Nickel-Silicon thin-film thermocouple system has been established for measuring instantaneous workpiece temperature in chemical explosive material machining. The NiCr/NiSi thin-film thermocouples have been deposited inside high speed steel cutters by magnetron sputtering. The typical deposition conditions are summarized. Static and dynamic calibrations of the NiCr/NiSi thin-film thermocouples are presented. The Seebeck coefficient of the TFTC is 40.4 μV/°C which is almost the same as that of NiCr/NiSi wire thermocouple. The response time is about 0.42ms. The testing results indicate that the developed NiCr/NiSi thin-film thermocouple sensors can respond fast enough to catch the very short temperature pulse and perform excellently when machining chemical explosive material in situ.

  Info
Periodical
Key Engineering Materials (Volumes 467-469)
Edited by
Dehuai Zeng
Pages
134-139
DOI
10.4028/www.scientific.net/KEM.467-469.134
Citation
Q. Y. Zeng, T. Hong, L. Chen, Y. X. Cui, "Magnetron Sputtering of NiCr/NiSi Thin-Film Thermocouple Sensor for Temperature Measurement when Machining Chemical Explosive Material", Key Engineering Materials, Vols. 467-469, pp. 134-139, 2011
Online since
February 2011
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$32.00
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