Paper Title:
Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction
  Abstract

We have developed new microdiffraction system at the SPring-8. This system uses a focused beam produced using a phase zone plate combined with a narrow slit, which makes a small focused beam that has a small angular divergence. Furthermore, we can use the two-dimensional x-ray CCD detector, which enable us to measure local reciprocal space maps at many points in a sample, that is, the distribution of strain fields and lattice tilts can be revealed in high-angular- and high-spatial-resolution.

  Info
Periodical
Edited by
Seiichi Miyazaki and Hitoshi Tabata
Pages
104-109
DOI
10.4028/www.scientific.net/KEM.470.104
Citation
S. Kimura, Y. Imai, O. Sakata, A. Sakai, "Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction", Key Engineering Materials, Vol. 470, pp. 104-109, 2011
Online since
February 2011
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