Paper Title:
Martensitic Transformation Behavior of Ni54.75Mn13.25Fe7Ga25 Ferromagnetic Shape Memory Thin Film
  Abstract

The Ni54.75Mn13.25Fe7Ga25 (at.%) ferromagnetic shape memory thin film was deposited onto silicon substrates using radio-frequency magnetron sputtering. The martensitic transformation, crystallographic structure, microstructure and magnetic-field induced strain were investigated by means of Differential Scanning Calorimetry (DSC), X-ray diffraction (XRD), Transmission Electron Microscope (TEM) and metal strain gauges. The results show that the martensite transformation temperature Ms is 296.6 K, the film with typical self-accommodated morphology is orthorhombic structure at room temperature. The field-induced strain of 52 ppm is obtained in this shape memory thin film.

  Info
Periodical
Key Engineering Materials (Volumes 474-476)
Edited by
Garry Zhu
Pages
408-412
DOI
10.4028/www.scientific.net/KEM.474-476.408
Citation
H. B. Wang, H. Xiong, L. Ma, W. Cai, "Martensitic Transformation Behavior of Ni54.75Mn13.25Fe7Ga25 Ferromagnetic Shape Memory Thin Film", Key Engineering Materials, Vols. 474-476, pp. 408-412, 2011
Online since
April 2011
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