Paper Title:
Influence of Ar+ Energy of Bombardment Cu Target and Low Energy Assisted Bombardment on Cu-W Thin Film Structure by Ion Beam Sputtering
  Abstract

This paper is to study the influence of Ar+ energy of bombardment Cu target and low energy assisted bombardment on Cu-W film structure in the preparation of Cu-W thin film by dual ion beam sputtering technique with iron as the substrate and argon as ion source. The results shown : when Ar+ energy of bombardment tungsten target is about 3keV, the beam of copper target is 20mA, Ar+ energy of bombardment Cu target is 1kev, 1.5kev and 2keV respectively, Cu-W thin film prepared by ion beam sputtering exists with the skeleton of tungsten in amorphous phase mixing with copper grains; with the increase of Ar+ energy of of bombardment copper target, the grain size of copper increases slightly; influenced by crystal defects and lattice distortion, copper diffraction peak offsets a little. Low energy assisted bombardment helps to increase grain growth of copper and can decrease crystal defects and lattice distortion. But with excessive energy, thin film fails to deposit.

  Info
Periodical
Key Engineering Materials (Volumes 474-476)
Edited by
Garry Zhu
Pages
448-453
DOI
10.4028/www.scientific.net/KEM.474-476.448
Citation
Y. P. Ai, Y. Y. Zeng, L. J. Liu, X. M. Huang, T. P. Zhou, "Influence of Ar+ Energy of Bombardment Cu Target and Low Energy Assisted Bombardment on Cu-W Thin Film Structure by Ion Beam Sputtering", Key Engineering Materials, Vols. 474-476, pp. 448-453, 2011
Online since
April 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Ju O. Park, Joon Hyung Lee, Jeong Joo Kim, Sang-Hee Cho
Abstract:ITO films were deposited on the Corning 1737 glass by the RF-magnetron sputtering method with and without external heating as a function...
481
Authors: Ž. Bogdanov, N. Popović, M. Zlatanović, B. Goncić, Z. Rakočević, S. Zec
Abstract:The reactive sputter deposition of TiN thin films onto glass substrate at the ambient temperature using a homemade broad beam argon ion...
303
Authors: Hong Tao Li, Bai Ling Jiang, Bo Yang, Zheng Cao
Abstract:Based on deposition rate of coatings and ion flux measured by Langmuir probe in sputtering environment, bombardment energy Ec1 of sputtered...
1839
Authors: Tao Chen, Duo Shu Wang, Yu Qing Xiong
Abstract:TiO2 films were fabricated on Si substrate by using electron-beam gun evaporation. Influence of deposition rate, deposition...
1233
Authors: Li Feng Wang, Ze Yan Wu, Zhi Jun Meng
Chapter 11: Environmental Protection and Economic Development
Abstract:In this work, we mainly summarize the influence of the ion bombardment cathode (target) and relative factors of magnetron sputtering yield in...
1655