Paper Title:
Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching
  Abstract

In parallel microplasma etching system, microplasmas are generated in the hollow pyramidal tips array and extracted through the nano-apertures at the tips for maskless locally etching. In this paper, SiO2 hollow pyramidal tips array and nano-apertures of 50~200nm diameters at the tips are successfully fabricated using a low temperature nonuniform thermal oxidation and selective wet etching on a silicon wafer with high efficiency and low cost. Key issues such as the factors influencing the tip shape and quality, nonuniform oxidation phenomenon, releasing of hollow tips array with high width-thickness ratio (hollow pyramidal tip base width/sidewall thickness) and nano-aperture etching are presented and analyzed in detail. The results of this paper may lay a good foundation for ongoing experiments of parallel microplasma maskless etching.

  Info
Periodical
Edited by
Xiaohao Wang
Pages
89-94
DOI
10.4028/www.scientific.net/KEM.483.89
Citation
W. W. Xiang, L. Wen, Q. P. Zhang, J. R. Chu, "Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching", Key Engineering Materials, Vol. 483, pp. 89-94, 2011
Online since
June 2011
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