In this study, SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target in Ar/CH4 gas mixture. Three types of substrates, AISI M2 grade high speed steel, glass, and Si (100) were used in each deposition. Films were grown with different compositions at 50 oC and 250 oC by varying (0–50 %) CH4/Ar processing gas ratios. Microstructural properties of SiC films were characterized by cross-sectional FE–SEM (Field–Emission Scanning Electron Microscope) observations. XRD (X–Ray Diffractometer) results indicated that films were amorphous. Friction coefficients as low as 0.1 were obtained from SiC coatings against Al2O3 balls, according to the tribological tests. Optical investigations showed that the transparency and opacity of SiC films could easily be tailored by modifying Si and C concentrations in the coatings.